A novel concept of multilayer soft mold for ultraviolet nanoimprint lithography was introduced. It is composed of (tridecafluoro-1, 1,2,2-tetrahydro-octyl)-trichlorosilane (FOTS)/SiO2/pattern polymer (perfluorinated acrylate mixture)/glass, where the FOTS is for releasing and SiO2 is for surface hardening and adhesion between the FOTS and pattern polymer. By using the multilayer soft mold, a dot array as small as 50 nm pitch was replicated from the Si master and imprinted on a Ru/Ta/Si substrate successfully. The x-ray photoelectron spectroscopy, contact angle measurement, and nanoindentation test revealed that the multilayer soft mold has good adhesion between layers, lower surface energy, and stiffer surface than the soft mold of pattern polymer/glass, respectively. (C) 2008 American Vacuum Society.