While a high supply voltage (> 15 V) is needed in the conventional EPD (electrophoretic deposition) methods, we propose a novel method in which deposition of dielectric films can be carried out using a low voltage (<10 V); we have used this method for the deposition of MgTiO3 films. MgTiO3 powder was dispersed in a solution of ethanol-Ti4+ with 3-9 V. Subsequently, the deposition of a MgTiO3 film with spherical nanoparticles in aggregated random shape particles was observed at the anode.