무정형 무기고분자의 구조해석을 위한 X선 산란함수의 수정

박성수

Polymer(Korea), Vol.22, No.3, 408-415, May, 1998

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무정형 무기고분자의 구조해석을 위한 X선 산란함수의 수정

Correction for Scattering Function of X-rays in the Structural Analysis of Amorphous Inorganic Polymers

박성수

초록

3차원 랜덤 망상구조의 무기고분자인 무정형 SiO₂ 시편에서 측정된 X선 회절강도로부터 정합산란강도만을 얻고자 하였다. 측정된 회절강도로부터 비정합산란을 수정하기 위하여 CuK_α 빔을 사용할 때는 비정합산란강도를 이론적으로 계산하여 제하였고, MoK_α 빔을 사용할 때는 Zr-Y 평형 필터에 의해 실험적으로 제거하였다. 측정된 회절강도로부터 다중산란을 수정하기 위하여 여러 종류의 X선 빔에 따라 무정형 SiO₂에서 발생하는 다중산란강도를 산출해주는 컴퓨터 프로그램을 작성하였다. 무정형 SiO₂의 단일산란 빔에 대한 다중산란 빔의 강도 비는 CuK_α 빔에서 0.10∼0.16%, MoK_α 빔에서 0.98∼5.87%와 AgK_α 빔에서 1.88∼17.86%이었다.

The objective of this work was to obtain the only coherent X-ray diffraction intensities from the amorphous SiO₂, a 3-dimentional random network inorganic polymer. To correct incoherent scattering from the measured diffraction intensity, incoherent scattering intensity was subtracted theoretically when using CuK_α radiation and it was eliminated experimentally with a Zr-Y balance-filter when using MoK_α radiation. To correct multiple scattering computer programs were developed to estimate multiple scattering intensity obtained in the amorphous SiO₂ with various X-rays. The intensity ratios of multiple scattering to single scattering in the amorphous SiO₂ were 0.10∼0.16% for CuK_α, 0.98∼5.87% for MoK_α, and 1.88∼17.86% for AgK_α radiation.

Keywords:correction;scattering;multiple;amorphous;silica

[References]

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[1] Huffman M, McMillan P, J. Non-Cryst. Solids, 76, 369 (1985)

[2] McMillan P, Piriou B, Couty R, J. Chem. Phys., 81, 4234 (1984)

[3] Bray PJ, Geissberger AE, Bucholtz F, Harris IA, J. Non-Cryst. Solids, 52, 45 (1982)

[4] Warren BE, J. Am. Ceram. Soc., 17, 249 (1934)

[5] Mozzi RL, Warren BE, J. Appl. Cryst., 2, 164 (1969)

[6] Sinclair RN, Wright AC, J. Non-Cryst. Solids, 57, 447 (1983)

[7] Freeman AJ, Phys. Rev., 12, 929 (1959)

[8] Short MA, Acta Crystallogr., 14, 486 (1961)

[9] Warren BE, Mavel G, Rev. Sci. Instrum., 36, 196 (1965)

[10] Ergun S, Braun W, Fitzer E, J. Appl. Cryst., 41, 1133 (1970)

[11] Shimazu M, Watanabe A, J. Appl. Cryst., 7, 531 (1974)

[12] Chandrasekhar S, "Radiation Transfer," chap. IX, Clarendon Press, Oxford (1950)

[13] Strong SL, Kaplow R, Acta Crystallogr., 23, 38 (1967)

[14] Warren BE, Mozzi RL, Acta Crystallogr., 21, 459 (1966)

[15] Meek TT, "An Energy Dispersive X-ray Diffraction Study of Vitreous Silica," Ph.D. Dissertation, Ohio State Univ. (1977)

[16] Dwiggins CW, Park DA, Acta Crystallogr. Sect. A, 27, 264 (1971)

[17] Cromer DT, Waber JT, Acta Crystallogr., 18, 104 (1965)

[18] Cromer DT, Acta Crystallogr., 18, 17 (1965)

[19] Keating DT, Rev. Sci. Instrum., 30, 725 (1959)

[20] Cullity BD, "Elements of X-ray Diffraction," Addison-Wesley Publishing, Massachusetts (1978)

[21] Milberg ME, J. Appl. Phys., 40, 293 (1958)

[22] Norman N, Acta Crystallogr., 10, 370 (1957)