In this study, the synthesis of the novel UV curable photosensitive polymers accomplished and applied for the Negative Photoresist. First, novel UV curable photosensitive polymers were synthesized by radical polymerization with a mixture of Styrene/ Methyl methacrylate/ Methacrylic acid/ Glycidyl methacrylate/ N-Cyclohexylmaleimide at a fixed rate. Following the first step, we prepare for the litho test with synthesized polymers incorporated Styrene. This novel polymers were optimized to negative photoresist. Also, we studied resolution and film retention with molecular weight of polymers and numerical value of Alkaline Desolution Rate(ADR). As a result of the litho test, we found that if the novel polymers have same numerical value of ADR, the resolution decreased and the film retention increased with the increase of molecular weight of photoresist binder.