Advanced Materials, Vol.20, No.10, 1962-1962, 2008
Nanopatterned self-assembled monolayers by using diblock copolymer micelles as nanometer-scale adsorption and etch masks
Nanopatterned self-assembled monolayers (SAMs) are obtained from a simple, straight-forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous hydrobhopic background or vice versa. The surfaces are shown to be excellent tools for the preparation of arrays of nanocrystals.