Advanced Materials, Vol.20, No.18, 3457-3457, 2008
Photoresist-free lithographic patterning of solution-processed nanostructured metal thin films
Nanostructured Ag thin films solution-deposited on glass and plastic substrates are patterned by direct exposure to a pulsed Nd:YAG laser without using a photoresist layer. Sharp-edged patterns with a feature size scaled down to ca. 2 mu m are obtainable.