Applied Surface Science, Vol.254, No.17, 5475-5480, 2008
Structural and morphological properties of thin ZnO films grown by pulsed laser deposition
The pulsed laser deposition technique was used to produce zinc oxide thin films onto silicon and Corning glass substrates. Homogeneous surfaces exhibiting quite small Root Mean Square (RMS) roughness, consisting of shaped grains were obtained, their grain diameters being 40-90 nm at room temperature and at 650 degrees C growth respectively. Films were polycrystalline, even for growth at room temperature, with preferential crystallite orientation the (0 0 2) basal plane of wurtzite ZnO. Temperature increase caused evolution from grain to grain agglomeration structures, improving crystallinity. Compressive to tensile stresses transition with temperature was found while the lattice constant decreased. (C) 2008 Elsevier B.V. All rights reserved.
Keywords:laser deposition;atomic force microscopy (AFM);transmission electron microscopy (TEM);X-ray diffraction (XRD);thin films coatings