Samarium fluoride (SmF3) films have been deposited on quartz, silicon and germanium substrates by vacuum evaporation method. The crystal structure of the films deposited on silicon substrate is examined by X-ray diffraction (XRD). The films deposited at 100 degrees C, 150 degrees C and 250 degrees C have the (1 1 1) preferred growth orientation, but the film deposited at 200 degrees C has (3 6 0) growth orientation. The surface morphology evolution of the films with different thickness is investigated with optical microscopy. It is shown that the microcrack density and orientation of thin film is different from that of thick film. The transmission spectrum of SmF3 films is measured from 200 nm to 20 mm. It is found that this material has good transparency from deep violet to far infrared. The optical constants of SmF3 films from 200 nm to 12 mm are calculated by fitting the transmission spectrum of the films using Lorentz oscillator model. (C) 2008 Elsevier B. V. All rights reserved.