화학공학소재연구정보센터
Applied Surface Science, Vol.255, No.4, 1617-1620, 2008
Development of a high lateral resolution TOF-SIMS apparatus for single particle analysis
A novel TOF-SIMS apparatus was designed and constructed aiming at single small particle analysis. The apparatus consisted of high lateral resolution TOF-SIMS part and SEM function for seeking analytical target. A pulsed Ga-focused ion beam ( FIB) was also newly developed for this purpose based on state-of-the art ion optics. Secondary ion yield of Al was 1.8 x 10 (2) which is high enough small area analysis, and mass resolution was also acceptable for element analysis. The most prominent feature, lateral resolution, was demonstrated to be 40 nm in actual mapping of an IC cross-section. As an application aerosol particles were analyzed individually. (C) 2008 Elsevier B. V. All rights reserved.