An antireflective structure with two-dimensional 300-nm periodicity was fabricated on a phosphate glass surface using an imprinting process with a SiC mold. The optimized structure designed using RCWA calculation was a convex circular cone sharing the ridge line of adjacent cones. The SiC mold was fabricated using electron beam drawing and subsequent reactive ion etching with CHF3 and O-2 gases. The glass' surface reflectance was estimated as 0.2% at 530 nm wavelength, which was approximately 1/20 that of the optically polished surface. (C) 2008 Elsevier B.V. All rights reserved.