Galvanostatically and potentiostatically formed surface oxide films on titanium in H2O2 free and H2O2 containing H2SO4 solutions were investigated. Conventional electrochemical techniques, electrochemical impedance spectroscopy (EIS) and scanning electron microscopy, were used. In the absence of H2O2, the impedance response indicated a stable thin oxide film which depends on the mode of anodization of the metal. However, in the presence of H2O2 the film characteristics were changed. A significant decrease in the corrosion resistance of the surface film was recorded. The film characteristics were also found to be affected by the mode of oxide film growth and polarization time. The EIS results and the impedance data fitting to equivalent circuit models have shown that the oxide film consists of two layers. The electrochemical characteristics of the anodic films formed under different conditions have been discussed.