Chromium electrodeposited from Cr(III)dimethyl formamide-bath was studied using brush electrodeposition (BED) technique. The effects of current density and plating time on thickness and current efficiency were studied. An advantage of BED Cr was to produce selective area deposition on a suitable substrate. Chromium deposits were characterized using XRD, SEM, and AFM. From the electrochemical studies, BED Cr have higher charge transfer resistance R (ct) and very low I (corr) than that of mild steel substrate.