화학공학소재연구정보센터
Journal of Crystal Growth, Vol.312, No.1, 52-57, 2009
Analysis of twin defects in GaAs nanowires and tetrahedra and their correlation to GaAs(111)B surface reconstructions in selective-area metal organic vapour-phase epitaxy
We analyzed twin defects in GaAs nanowires as thin as 100-400 nm and tetrahedral structures as small as 1.0 mu m, which were selectively grown by metal organic vapour-phase epitaxy (MOVPE) within a SiO2 mask window fabricated on GaAs(1 1 1)B substrates. In particular, we focused on the correlation between the twins and GaAs(1 1 1)B surface reconstructions. We confirmed that the shape of GaAs cyrstals selectively grown on GaAs(1 1 1)B substrates changed from hexagonal nanowires to truncated tetrahedra when the size of the mask opening was increased from 100 to 1000 nm under the same growth conditions. The shape also changed from tetrahedral to hexagonal with decreasing growth temperature (T-g : 600-800 degrees C) and with increasing arsine (AsH3) partial pressure (1.0 x10(-4) to 5.0 x 10(-4) atm). Rotational twins around the < 1 1 1 > axis were found in the tetrahedra by transmission electron microscopy (TEM) and scanning electron microscopy observations. In addition, the probability of twins developing in the tetrahedra increased with decreasing mask opening size, with decreasing T., and with increasing AsH3 partial pressure. The TEM study also revealed the existence of a high density of rotational twins in the nanowires, and their density increased with decreasing nanowire diameter, suggesting a correlation between the twins and the shape/size of GaAs crystals. These findings were semi-quantitatively compared with a reported phase diagram for GaAs(1 1 1)B surface reconstruction. By analyzing the relationship between twin development and MOVPE conditions, we found that the shape change of GaAs crystals on GaAs(1 1 1)B and the formation of twins coincided well with the transition of GaAs surface reconstruction between the (2 x 2) and (root 19 x root 19) structures. (C) 2009 Elsevier B.V. All rights reserved.