Ni0.5Zn0.5Fe2.0O4.0 thin films (NZFs) were deposited on Si (100) substrate by a sol-gel method, and the effects of annealing parameters on the structure and magnetic properties of the proposed films were investigated. Moderate heating rate was beneficial to the nucleation of NZFs. When the heating rate was 2 A degrees C/min the saturation magnetization (M (s)) achieved its maximum and the coercivity (H (c)) reached its minimum. Both the crystallization and M (s) of NZFs enhanced with increasing annealing time; however, H (c) changed contrarily. High quenching temperature produced a large stress and consequently deteriorated magnetic properties. The optimal annealing parameters of NZFs were annealed at 700 A degrees C, heating rate 2 A degrees C/min, annealing time 1 h, and gradually cooled to room temperature. Finally, NZFs showed a high magnetization of 320 emu/cm(3) and low coercivity of 86 Oe.