The thermal stability and magnetic anisotropies of nickel nanoplates with {111} planes as the exposure plane are studied. The melting point of Ni nanoplates drastically drops as compared to that of the bulk one due to the significant increase in the surface free energy. For the large aspect ratio, these nanoplates tend to lie flat on silicon wafer and form a thin Ni {111} plane film. Both the coercivity and the remnant magnetization of the Ni film deeply depend on the applied field direction. As the angle between the film plane and the applied field direction varies from zero to 45A degrees and to 90A degrees, the coercivity measured at 5 K increases from 335 Oe to 373 and to 410 Oe. Correspondingly, the remnant magnetization decreases from 18.1 to 15.8 to be 10.4 emu/g.