Poly(4-hydroxystyrene) (PHS) has been used in lithography as a backbone polymer and is also a promising material for extreme-ultraviolet or electron beam lithography. The dynamics of PHS radical cations generated upon exposure to electron beam were investigated. The transient absorption of PHS was observed in the near-infrared region in p-dioxane solutions by pulse radiolysis. Charge resonance (CR) bands that represent, pi-pi interaction between the two chromophores of the intramolecular PHS dimer radical cation were observed, whereas p-cresol shows no distinct CR band. Although the radical cations of phenol derivatives are known to be easily deprotonated, it was found that the dimer radical cation formation leads to less deprotonation by its charge resonance stabilization.