A symmetric block copolymer was spontaneously assembled into a laterally stacked, one-dimensional lamellar assembly along the chemically stripe patterned surfaces. The lateral dimension or the linear lamellar assembly was in the 20 run scale, whereas the dimension Of the Surface Stripe pattern directing the linear assembly was in the range of conventional photolithography (70-- 150 nm). The orientation and shape of the one-dimensional array were varied according to the free-form design of the surface stripe patterns. Our approach provides an opportunity of combining block copolymer assembly with a conventional photolithography to generate well-registered, one-dimensional lamellar assembly that is Potentially useful for various nanodevices.