Pulsed electron deposition (PED) is a novel thin film growth technique with unique advantages for industrial-scale manufacturing. Previously, no investigations into local deviations in stoichiometry have been carried out. The authors report the first analysis of large-scale compositional variations in thin films deposited via PED. Ablated lead telluride (PbTe) was deposited at various target-substrate distances on 5 cm(2) substrates. Rutherford backscattering was employed to systematically analyze compositional variation at different positions within the deposition. Stoichiometry is reported as a function of both distance and angular displacement. Deposition rates for the center of the ablated plume are reported. The authors show PED to be capable of uniform deposition over areas of moderate (0.5-1 cm(2)) size, with an enrichment of heavier elements in the center of the film. The results are explained within the context of expanding plasma behavior.