20-nm-thick Ti0.94Fe0.O-06(2)/Tt(0.94)Mn(0.06)O(2) (TFO/TMO) superlattice films, where each alternating layer is about 0.27 nm thick, were prepared at 500 degrees C by pulsed-laser deposition on (1 (1) over bar 02)-sapphire substrates with and without atomic flatness. The authors then investigated structural and ferromagnetic properties of these TFO/TMO superlattice films. The superlattice films deposited on atomically flattened sapphire substrates exhibit an excellent crystallinity, smoother surface morphology, and higher saturation magnetization and coercive field than the films deposited on sapphire substrates without atomic flatness. The superlattice films exhibit no segregated impurity phase and obey a three-dimensional spin wave model, indicating a ferromagnetic property. (C) 2009 American Vacuum Society. [DOI: 10.1116/1.3049480]