화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.27, No.6, 2508-2511, 2009
Patterning decomposable polynorbornene with electron beam lithography to create nanochannels
Unity (R) 4671E sacrificial material is a decomposable negative tone polymer sensitive to ultraviolet radiation. In this study, it is shown that Unity (R) 4671E can also be patterned by electron beam lithography. Nanochannels with a width of 65 nm and a pitch of 200 nm have been fabricated. The developed Unity (R) 4671E patterns can thermally decompose and the products can permeate through the encapsulating material leaving nanocavities. This direct write electron-beam process has fewer processing steps than other published fabrication methods.