In this article the authors present a graphoepitaxy process of ordering block copolymer domains using removable templates, and analyze the spatial correlation between the template and the microdomain locations. Removable polymeric templates can guide the self-assembly of block copolymers in the same manner as the widely used inorganic templates, such as silica, but the ability to remove them provides new options for the fabrication process and for the final pattern that is formed after etch or lift-off processing. The use of removable templates was demonstrated by fabricating well-ordered freestanding arrays of silica and tungsten posts by transferring only the template block copolymer pattern into underlying films. Errors in the domain placement had a standard deviation between 1.9 and 2.3 nm from an ideal 28.6 nm peiod pattern.