In this article, the authors present an alternative approach to electron beam lithography allowing the fabrication of gap electrodes with dimensions less than 200 nm. This approach consists of the soft ultraviolet nanoimprint lithography on nonstandard sample sizes, using polydimethylsiloxane (PDMS) as a flexible mold material. By simple deposit of the PDMS mold on the substrate, they succeeded in imprinting gaps in Amonil and the transfer of patterns of polymethylmethacrylate/Amonil bilayer was achieved by etching the substrate with a suitable reactive ion etching process. The imprint pressure was ensured by only the weight of the PDMS mold.