The interference of multiple counterpropagating surface plasmon waves as a lithography technique to pattern periodic two-dimensional features is proposed and illustrated in this article. The surface plasmons are generated by prism coupling method, by employing a custom made prism layer configuration and with a single exposure. 175 nm periodic two-dimensional dot array patterns, with feature size as small as 93 nm, have been realized using an exposure radiation of 364 nm wavelength.