Fabrication of ultrasharp tips for scanning tunneling microscopy is inherently a two-step procedure, typically involving an etch process and postetch cleaning. From the myriad of etching parameters available in literature a procedure is presented that allows quantitative optimization and the routine production of tips with 3-10 nm radius of curvature. These ideally shaped tips require final oxide removal. Utilizing a custom designed e-beam heater element, oxide removal without localized melting is realized.