The formation of a siloxane self-assembled monolayer (SAM) film on a lithium niobate substrate was investigated for surface acoustic wave (SAW) sensor devices for the detection of hydrogen. The most widely used SAM coupling reagent, octadecyltrichlorosilane, etches aluminum metal features that are integral to sensor devices, due to the formation of high local concentrations of hydrochloric acid. An alternative coupling reagent, octadecyltrimethoxysilane (OTMS), does not show any etching of metal parts. OTMS and related molecules are compatible with conventional SAW device manufacturing techniques and other devices that contain metal features susceptible to etching by acid released in the SAM formation process.