This work addresses the microstructure and electrochemical characteristics of sputtered metallic iridium thin films. The evolution of microstructure and its influence on the charge delivery characteristics is investigated by means of Monte Carlo-simulated Ir metal deposition. The results are compared to experimental findings presented in Part I of this publication [J. Electrochem. Soc., 155, F61 (2008)]. Energy and angular distributions of adatoms are varied between the process sets, causing the formation of distinct microstructures. The two developed simulators describe the transport of sputtered atoms from target to substrate as well as film growth. The film growth simulator explains experimentally observed changes in anodically delivered charge on grounds of the availability of Ir reaction sites for charge exchange reactions. The model also predicts the development of crystallographic orientation in dependence of sputter parameters. (C) 2008 The Electrochemical Society.