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Journal of the Electrochemical Society, Vol.156, No.4, J73-J76, 2009
ZnSe Nanowire Photodetector Prepared on Oxidized Silicon Substrate by Molecular-Beam Epitaxy
We reported the growth of ZnSe nanowires on oxidized Si substrate by molecular-beam epitaxy. It was found that average length, average diameter, and density of the ZnSe nanowires were 1.2 mu m, 48 nm, and 1.04x10(7) cm(-2), respectively. It was also found that the ZnSe nanowires were structurally uniform and defect-free with a pure zinc blend structure. UV photodetectors were then fabricated by sputtering a thick Au film through an interdigitated shadow mask onto the ZnSe nanowires. It was found that photocurrent to dark current contrast ratio of our ZnSe nanowire photodetector was >90 with 0.1 V applied bias.
Keywords:II-VI semiconductors;molecular beam epitaxial growth;nanowires;photodetectors;zinc compounds