Comparison of the photovoltaic efficiency on DSSC for nanometer sized TiO2 using a conventional sol-gel and solvothermal methods

Yeji Lee; Jinho Chae; Misook Kang

Journal of Industrial and Engineering Chemistry, Vol.16, No.4, 609-614, July, 2010

DOI10.1016/j.jiec.2010.03.008 Export Citation

Comparison of the photovoltaic efficiency on DSSC for nanometer sized TiO2 using a conventional sol-gel and solvothermal methods

Yeji Lee, Jinho Chae, and Misook Kang^†

Department of Chemistry, College of Science, Yeungnam University, Gyeongsan, Gyeongbuk, 712-749, South Korea

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When the two types of TiO2 coatings prepared by sol-gel and solvothermal methods were applied to dye-sensitized solar cell (DSSC) in this study, the energy conversion efficiency of the solvothermalmodified TiO2 was considerably higher than that on the sol-gel modified TiO2; approximately 8.51 (solvothermal) and 5.93% (sol-gel) with the N719 dye under 100 mW/cm2 of simulated sunlight, respectively. These results are in agreement with an electrostatic forcemicroscopy (EFM) study showing that the electrons were transferred rapidly to the surface of the solvothermal-modified TiO2 film, compared with that on a sol-gel modified TiO2 film. Furthermore, FT-IR analysis of the films after N719 dye adsorption showed that the solvothermal-modified TiO2 had a strong band at 500 cm^(-1), which was assigned to metal-O, due to a new Ti-O bond between the O of COO^(-) and a Ti atom. This peak was considerably weaker in the sol-gel modified TiO2.

Keywords:Solvothermal-modified TiO2;Sol-gel modified TiO2;DSSC;Photovoltaic efficiency;EFM image

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Lee JK, Jeong BH, Jang SI, Kim YG, Jang YW, Lee SB, Kim MR, J. Ind. Eng. Chem., 15(5), 724 (2009)
Li YL, Ishigaki T, J. Cryst. Growth, 242(3-4), 511 (2002)
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Lee BY, Park SH, Lee SC, Kang M, Park CH, Choung SJ, J. Ind. Eng. Chem., 20, 812 (2003)
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Girard PP, Inst. Phys. Pub. Nanotechnol., 12, 485 (2001)

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[1] O’Regan B, Gratzel M, Nature., 353, 737 (1991)

[2] Gratzel M, Nature., 414, 338 (2001)

[3] Gratzel M, Inorg. Chem., 44(20), 6841 (2005)

[4] Chu D, Yuan X, Qin G, Xu M, Zheng P, Lu J, Zha L, J. Nanopart. Res., 10, 357 (2008)

[5] Ohno T, Akiyoshi M, Umebayashi T, Asai K, Mitsui T, Matsumura M, Appl. Catal. A: Gen., 265(1), 115 (2004)

[6] Torres GR, Lindgren T, Lu J, Granqvist CG, Lindquist SE, J. Phys. Chem. B, 108(19), 5995 (2004)

[7] Gaetzel M, Mcevoy AJ, Asian J. Energy Environ., 5, 197 (2004)

[8] Kuang DB, Klein C, Ito S, Moser JE, Humphry-Baker R, Evans N, Duriaux F, Graetzel C, Zakeeruddin SM, Graetzel M, Adv. Mater., 19(8), 1133 (2007)

[9] Lee JK, Jeong BH, Jang SI, Kim YG, Jang YW, Lee SB, Kim MR, J. Ind. Eng. Chem., 15(5), 724 (2009)

[10] Li YL, Ishigaki T, J. Cryst. Growth, 242(3-4), 511 (2002)

[11] Klug HP, Alexander LF, X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd ed., John Wiley & Sons, Inc., 716 (1954)

[12] Gra¨ tzel M, J. Photochem. Photobiol., 4, 145 (2003)

[13] Kalyanasundaran K, Gra¨ tzel M, Coord. Chem. Rev., 77, 347 (1999)

[14] Lee BY, Park SH, Lee SC, Kang M, Park CH, Choung SJ, J. Ind. Eng. Chem., 20, 812 (2003)

[15] Serry FM, Kjoller K, Thornton JT, Tench RJ, Cook D, Electric Force Microscopy, Surface Potential Imaging, and Surface Electric Modification with the Atomic Force Microscope, Veeco Instruments, Inc. (2007)

[16] Vorburger TV, Dagata JA, Wilkening G, Lizuka K, in: Czanderna, et al. (Eds.), Beam Effects, Characterization of Surface Topography, and Beam Effects Depth Profiling in Surface Analysis, Plenum Press, New York (1998)

[17] Sun HT, Li ZH, Zhou J, Zhao YY, Lu M, Appl. Surf. Sci., 253(14), 6109 (2007)

[18] Girard PP, Inst. Phys. Pub. Nanotechnol., 12, 485 (2001)