Advanced Materials, Vol.21, No.47, 4769-4792, 2009
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.