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Electrochemical and Solid State Letters, Vol.13, No.3, K26-K28, 2010
High Energy Excitation Transfer from Silicon Nanocrystals to Neodymium Ions in Silicon-Rich Oxide Film
In this work, direct experimental evidence of the excitation energy transfer from silicon quantum dots (Si-QDs) to Nd ions has been given based on photoluminescence (PL) and PL excitation measurements in a wide spectral range. The indirect excitation of Nd ions by transfer from excited Si-QDs is possible and even more efficient at higher energy levels (I-4(9/2)-> D-4(3/2), D-4(5/2)) than the indirect excitation reported up to now at lower energy (I-4(9/2)-> F-4(3/2) -F-4(7/2)) levels.
Keywords:elemental semiconductors;ion implantation;nanostructured materials;neodymium;photoluminescence;semiconductor quantum dots;silicon;silicon compounds;thin films