Previous Article Next Article Table of Contents Electrochemical and Solid State Letters, Vol.13, No.4, S3-S3, 2010 DOI10.1149/1.3310836 Export Citation Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas (vol 13, pg G13, 2010) Won SJ, Suh S, Lee SW, Choi GJ, Hwang CS, Kim HJ Please enable JavaScript to view the comments powered by Disqus.
