화학공학소재연구정보센터
Electrochemical and Solid State Letters, Vol.13, No.7, H248-H252, 2010
Effects of Process Variables on TiN Particle Formation during Metallorganic Chemical Vapor Deposition
Titanium nitride particles formed in thermal and plasma-enhanced metallorganic chemical vapor deposition processes using tetrakis(diethylamino)titanium were investigated. Particle formation was studied by using a particle beam mass spectrometer calibrated by a certificate reference material (NaCl) as a function of process variables such as bubbler temperature, deposition temperature and pressure, sampling positions in the reactor, plasma conditions, and a flow rate of carrier gas. From these results, the effects of the sampling position and the thermal and plasma energies were studied. These measured results were in reasonable agreement with the transmission electron microscopy results. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3418338] All rights reserved.