The pitting corrosion of Al, and two Al-Cu alloys, namely (AI-2.5% Cu) and (AI-7.0% Cu) was investigated in gluconic acid (HG) solution through linear polarization and cyclic voltammetry techniques complemented with ex situ EDX and SEM examinations of the electrode surface. Inductively coupled plasma-atomic emission spectroscopy (ICP-AES) method of chemical analysis was used to study the effect of alloyed Cu on the rate of the uniform corrosion of Al in these solutions. Results obtained from ICP were compared with those obtained from polarization measurements. For the three Al samples, the anodic responses did not involve active/passive transition due to spontaneous passivation. Addition of HG induced pitting (confirmed from SEM) within the passive oxide film due to the aggressive attack of gluconate (G(-)) anions. Relationships between pitting potential (E-pit), HG concentration, temperature, pH and potential scan rate were established. Alloyed Cu was found to enhance uniform corrosion, while it suppressed pitting attack. Local acidification model is employed to explain passivity breakdown induced by pitting corrosion as a result of the aggressive attack of G(-) anions. (C) 2010 Elsevier Ltd. All rights reserved.