Previous Article Next Article Table of Contents Inorganic Chemistry, Vol.33, No.6, 1227-1229, 1994 DOI10.1021/ic00084a043 Export Citation (TiCl4(NH3)2) - An Improved Single-Source Precursor to Titanium Nitride Films - Crystal and Molecular-Structure of (TiCl4(Tppo)2) (Tppo=tripiperidinophosphine Oxide) Winter CH, Lewkebandara TS, Proscia JW, Rheingold AL Keywords:CHEMICAL VAPOR-DEPOSITION;THIN-FILMS;TIN;CHEMISTRY;COATINGS Please enable JavaScript to view the comments powered by Disqus.
