Journal of Crystal Growth, Vol.312, No.4, 621-623, 2010
Layer-by-layer growth of SrFeO3-delta thin films on atomically flat single-terminated SrRuO3/SrTiO3 (111) surfaces
We successfully grew SrFeO3-delta thin films in a layer-by-layer manner by pulsed laser deposition (PLD). When the SrFeO3-delta films were directly grown on atomically flat Ti4+-terminated SrTiO3 (1 1 1) substrates, the oscillatory reflection-high-energy-electron-diffraction intensity was completely damped after its third oscillation. By contrast, the introduction of SrRuO3 buffer layers onto the SrTiO3 substrates allowed the SFO thin films to grow in a layer-by-layer manner over a far-extended thickness range. The probable mechanism of that growth is electronic reconstruction-reduced electrostatic potential divergence. With that result, the present study provides a means of growing pseudocubic (1 1 1)-oriented SrFeO3-delta heterointerfaces, making possible the fabrication of high-functionality oxide heterostructures. (C) 2009 Elsevier B.V. All rights reserved.
Keywords:Reflection high energy electron diffraction;Atomic layer epitaxy;Laser epitaxy;Oxides;Perovskites