화학공학소재연구정보센터
Journal of Crystal Growth, Vol.312, No.8, 1080-1084, 2010
Low temperature growth of Ga1-xInxP bulk crystals from InSb-rich melt
Bulk growth of phosphorus and arsenic based ternary III-V semiconductor crystals using pseudo-binary melts such as GaP-InP, GaP-GaAs, AlAs-GaAs, etc. is significantly challenging due to the high vapor pressures of group V species in conjunction with slow growth rates and the need for melt replenishment and mixing during growth. Lowering the growth temperature is desirable such that the vapor pressures of P and As can be easily handled. Low growth temperatures could be achieved by using Ga or In rich solutions. However, this approach is less attractive for growing bulk crystals due to several experimental difficulties including sticking of the growth solution to the crucible wall and to the grown crystal, making it challenging for crystal extraction. Growth of ternary crystals from low temperature quaternary melts has been found to be attractive. In this paper, we will present a new method for the growth of Ga1-xINxP from InSb rich Ga1-xInxPySb1-y melts at low growth temperatures in the range of 800-1050 degrees C. Thermodynamic phase diagrams calculated at various temperatures using a Gibbs free energy minimization software and materials databases commercially available from Thermo-Calc software will be presented along with experimental validation for Ga1-xInxP crystals grown at 1000 degrees C. (C) 2009 Elsevier B.V. All rights reserved.