The synthesis of statistical and block copolymers, consisting of monomers often used as resist materials in photolithography, using reversible addition-fragmentation chain transfer (RAFT) polymerization is reported. Methacrylate and acrylate monomers with norbornyl and adamantyl moieties were polymerized using both dithioester and trithiocarbonate RAFT agents. Block copolymers containing such monomers were made with poly(methyl acrylate) and polystyrene macro-RAFT agents. In addition to have the ability to control molecular weight, polydispersity, and allow block copolymer formation, the polymers made via RAFT polymerization required end-group removal to avoid complications during the photolithography. (C) 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 943-951, 2010