Forces of adhesion between a hydroxylated silicon oxide tip and a TiO2(110) surface, before and after irradiation of the surface with 254 nm light, were measured using atomic force microscopy. The work of adhesion before and after irradiation was 32 and 166 mJ/m(2), respectively, but a difference was observed only if ultraviolet light exposure was used in the presence of oxygen. The change in adhesion correlated strongly with decreasing water contact angle, which changed from ca. 70 to 0 degrees because of irradiation. The contrast in adhesion between irradiated and nonirradiated regions of the surface makes possible a simple method of patterning molecules with micrometer, and potentially nanoscale, resolution. As an example, fluorescein was selectively adsorbed onto hydrophilic regions of the surface by spin coating an ethanolic fluorescein solution onto TiO2(110) that had been irradiated through a photomask.