We describe photopatterning technique that employs the photodegradation of cell-adhesive-modified poly(ethyleneimine) (rn-PEI) to fabricate precise micropatterns on the indium tin oxide (ITO) substrate for guided neuronal growth. The photodegradation of m-PEI coated on hydroxyl group-terminated ITO substrate created micropatterns over a large area through deep UV irradiation. The photopatterned m-PEI layer can effectively guide neurite out-growth and control neurite extensions from individual neurons.