Journal of Industrial and Engineering Chemistry, Vol.17, No.3, 504-509, May, 2011
Removal of Cu(II)-ion over amine-functionalized mesoporous silica materials
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The capability for the adsorption of Cu(II)-ion with mesoporous silica materials, such as MCM-41, SBA-15 and XPD-2412, after functionalizing with amine groups, such as aminopropyltriethoxysilane (APTES), N(β-aminoethyl) γ-aminopropylmethyl dimethoxysilane (AEAPMDMS) and N1-(3-(trimethoxysilyl)-propyl) diethylenetriamine (TMSPDETA), was investigated in this study. N2 adsorption, XRD and elemental analysis methods were performed to gain an understanding of the structure and surface properties of the mesoporous silica materials. Of the absorbent materials, MCM-41, functionalized with APTES, showed the best activity for the adsorption of Cu(II)-ion. Compared with the mesoporous silica materials functionalized with APTES, those functionalized with AEAPMDMS and/or TMSPDETA showed lower adsorption capabilities, whichmay have been due to the locations of the amine groups. Most of the amine-organic domains were suggested should exist near the opening of channels or external surfaces.
Furthermore, the rate of adsorption of Cu(II)-ions matched well with a pseudo-second-order kinetic model.
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