One-step direct nanoimprinting into cubic-silsesquioxane (SSQ) films create low surface energy, high-modulus, thermally stable, and UV-transparent patterns that can then be used as secondary molds for both thermal and UV versions of nanoimprinting. The optimization of these materials is demonstrated by varying the microstructure of the initial SSQ material. The pattern fidelity for features as small as 10 nm is quantified using X-ray reflectivity and AFM.