A series of novel precursors for MOCVD of metallic copper have been synthesized and structurally characterized. These precursors are composed of Cu(hfacac)(2), which serves as a volatile source of Cu, and amino alcohols, which act as reductants and anchor firmly to the copper center through the amine unit. In some cases, a proton transfer from the coordinated alcohol to the hfacac ligand results in the formation of an alkoxide unit and the release of the free Hhfacac. Metallic copper films can be deposited by MOCVD at 300 degrees C without any external reductant. Crystal data : Cu(hfacac)(2) . C7H8 (-103 degrees C), a = 6.510(6) Angstrom, b = 8.594(7) Angstrom, c = 18.478(15) Angstrom, orthorhombic space group Pmnn, Z = 2; Cu(hfacac)(2)(H2NCH2CH2OH) (-158 degrees C), a = 13.145(1) Angstrom, b = 13.418(1) Angstrom, c = 11.245(1) Angstrom, alpha = 110.39(1)degrees, beta = 99.12(1)degrees, gamma = 97.90(1)degrees, triclinic space group , Z = 4; [Cu(hfacac)(Me2NCH2CH2O)](2) (-153 degrees C), a = 9.259(2) Angstrom, b = 12.011(3) Angstrom, c = 6.304(1) Angstrom, a 91.19(1)degrees, beta = 106.66(1)degrees, gamma = 74.83(1)degrees, triclinic space group , Z = 1; Cu(hfacac)[N(CH2CH2OH)(2)(CH2CH2O)]. MeOH (-168 degrees C), a = 10.075(4) Angstrom, b = 8.611(4) Angstrom, c = 19.259(9) Angstrom, beta = 99.82(2)degrees, monoclinic space group P2(1)/m, Z = 4.