In this article, I will introduce recent developments of environmental-friendly materials fabricated using atomic layer deposition(ALD). Advantages of ALD include fine control of the thin film thickness and formation of a homogeneous thin fim on complex－structured three-dimensional substrates. Such advantages of ALD can be exploited for fabricating environmental-friendly materials. Porous membranes such as anodic aluminum oxide (AAO) can be used as a substrate for TiO2 coating with a thickness of about 10 nm, and the TiO2-coated AAO can be used as filter of volatile organic compound such as toluene. The unique structural property of AAO in combination with a high adsorption capacity of amorphous TiO2 can be exploited in this case. TiO2 can be also deposited on nanodiamonds and Ni powder, which can be used as photocatalyst for degradation of toluene, and CO2 reforming of methane catalyst, respectively. One can produce structures, in which the substrates are only partially covered by TiO2 domains, and these structures turns out to be catalytically more active than bare substrates, or complete core-shell structures. We show that the ALD can be widely used not only in the semiconductor industry, but also environmental science.