Previous Article Next Article Table of Contents Inorganic Chemistry, Vol.39, No.9, 2008-2010, 2000 DOI10.1021/ic990266a Export Citation Synthesis and characterization of (hfac)In(CH3)(2): A volatile compound useful for CVD of indium and indium-containing materials Xu CY, Baum TH, Guzei I, Rheingold AL Keywords:CHEMICAL-VAPOR-DEPOSITION;THIN-FILMS;PRECURSORS;ALLOYS Please enable JavaScript to view the comments powered by Disqus.
