Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl(2)+2H(2)O precursors with pure oxygen flowing at a rate of 5 ccpm. Optical and electrical properties were studied for determining the relationship between physical properties and production parameters of the resultant thin films. The structure was analyzed by scanning electron microscopy and X-ray diffraction methods. Electrical and optical properties were studied to determine resistivity, visible light transmission and infrared transmission optical transmittance of the coatings for different, specific application areas. (C) 2011 Elsevier B.V. All rights reserved.