Journal of Crystal Growth, Vol.338, No.1, 103-106, 2012
Critical thickness of the 2-dimensional to 3-dimensional transition in GaSb/GaAs(001) quantum dot growth
The phase transformation from planar to quantum dot growth is driven by strain energy reduction at the cost of surface energy. By calculating and comparing the strain energies of monolayer thick GaSb and InAs films on GaAs(001), a critical thickness for the 2-dimensional to 3-dimensional phase transformation of about 1.2 ML was derived for the GaSb/GaAs quantum dot system. This value is in agreement with the direct observation of the effectively deposited amount of material using cross-sectional scanning tunneling microscopy. Deviating experimental literature values can be traced back to the neglect of the Sb-for-As exchange process. (C) 2011 Elsevier B.V. All rights reserved.
Keywords:Nanostructures;Stresses;Metal-organic chemical vapor deposition;Molecular beam epitaxy;Nanomaterials;Semiconducting III-V materials