Correlation between Ti2O3 and oxygen absorption property of partially reduced TiO2 (TiO2-x)

YoonKeun Chae; JinWon Park; Shinsuke Mori; Masaaki Suzuki

Journal of Industrial and Engineering Chemistry, Vol.18, No.5, 1572-1576, September, 2012

DOI10.1016/j.jiec.2012.01.049 Export Citation

Correlation between Ti2O3 and oxygen absorption property of partially reduced TiO2 (TiO2-x)

YoonKeun Chae, JinWon Park , Shinsuke Mori¹, and Masaaki Suzuki^{1, †}

Department of Chemical and Biomolecular Engineering, University of Yonsei, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, South Korea
¹Department of Chemical Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152-8552, Japan

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The partial reduction of TiO2 was investigated by hydrogen plasma treatment and it was performed to examine the oxygen absorption property of partially reduced TiO2 (TiO2-x). In this experiment, TiO2-x was analyzed by X-ray diffraction (XRD) and oxygen absorption of partially reduced TiO2 was measured by gas chromatography (GC). Consequently, it was shown that hydrogen plasma treatment can partially reduce TiO2 by plasma effects and TiO2-x can adsorb oxygen. The H2O formation and the oxygen absorption were found to be dependent on the heating temperature. The oxygen absorption property was attributed to the formation of Ti2O3.

Keywords:Hydrogen plasma;Reduction;TiO2;Oxygen absorption;Ti2O3

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[1] Kim SS, Lee H, Na BK, Song HK, Catal. Today, 89(1-2), 193 (2004)

[2] Belmonte T, Thie´ baut JM, Michel H, Cardoso RP, Maliska A, Journal of Vacuum Science and Technology., 20/4, 1353 (2002)

[3] Aarthi T, Madras G, Catalysis Communications., 9, 630 (2008)

[4] Kase M, Moriya I, Yotsumoto T, Taoda H, Japanese Patent No. 2004-137087, May 13 (in Japanese). (2004)

[5] Taoda H, Watawabe E, Nonami T, Fukuya M, Japanese Patent No. 3288265, March 15 (in Japanese). (2002)

[6] Yoong LS, Chong FK, Dutta BK, Energy, 34(10), 1652 (2009)

[7] Yu CL, Yu JC, Zhou WQ, Yang K, Catal. Lett., 140(3-4), 172 (2010)

[8] Bozorgtabar M, Rahimipour M, Salehi M, Surface Engineering., 26, 422 (2010)

[9] Lefe` vre G, Fe´doroff M, Cˇerovic LJ, Surface Engineering., 24, 272 (2008)

[10] Moon J, Park JA, Lee SJ, Zyung T, Kim ID, Sensors and Actuators B: Chemical., 149, 301 (2010)

[11] Park H, Kim WR, Jeong HT, Lee JJ, Kim HG, Choi WY, Solar Energy Materials and Solar Cells., 95, 184 (2011)

[12] Henderson MA, Epling WS, Perkins CL, Peden CHF, Diebold U, J. Phys. Chem. B, 103(25), 5328 (1999)

[13] Izumi A, Ueno T, Miyazaki Y, Oizumi H, Nishiyama I, Thin Solid Films, 516(5), 853 (2008)

[14] Belousov VM, Vasylyev MA, Lyashenko LV, Vilkova NY, Nieuwenhuys BE, Chem. Eng. J., 91(2-3), 143 (2003)

[15] Ulrike D, Surface Science Reports., 48, 53 (2003)

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[17] Me´ne´ trey M, Markovits A, Minot C, Journal of Molecular Structure (THEOCHEM)., 808, 71 (2007)

[18] Bredow T, Pacchioni G, Chem. Phys. Lett., 355(5-6), 417 (2002)

[19] Gopel W, Rocker G, Freierabend R, Physical Reviews B., 28, 3427 (1983)

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[21] Uner D, Tapan NA, Ozen I, Uner M, Appl. Catal. A: Gen., 251(2), 225 (2003)