Journal of the American Chemical Society, Vol.133, No.31, 11868-11871, 2011
Molecular Lithography through DNA-Mediated Etching and Masking of SiO2
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO2 at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO2 substrate.