화학공학소재연구정보센터
Macromolecular Rapid Communications, Vol.32, No.19, 1526-1532, 2011
Selective and Sequential Re-Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays
We report that the nanostructures of poly(styrene-block-4-vinylpyridine) block copolymer (PS-b-P4VP) thin film on a wafer substrate can be re-assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre-loaded inside or on the surface of PS-b-P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.