Previous Article Next Article Table of Contents Advanced Materials, Vol.24, No.19, 2608-2613, 2012 DOI10.1002/adma.201104871 Export Citation Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early Tseng YC, Mane AU, Elam JW, Darling SB Keywords:lithography;semiconductors;patterning;resists;sequential infiltration synthesis (SIS) Please enable JavaScript to view the comments powered by Disqus.
